Course Overview

This course is an introduction to fabrication processes and characterization of semiconductor devices. The course will focus on the basic physical phenomenon and underlying technologies that involved in each process, and the basic techniques for device characterization. Specifically, students are exposed to two major types of semiconductor growth technologies which are known as Chrosralski growth and epitaxy growth technologies. For device fabrication, students are exposed to mainly the top-down approaches which are lithography and dry etching technique applying plasma processing technologies. Electrical and optical characterization as well as physical characterization using microscopy technologies will be described.

Learning Achievement

1. Able to explain the fundamentals of semiconductor material growth technologies. 2. Able to explain the fundamentals of fabrication processes and device characterization techniques. 3. Communicate and work in a team to accomplish the given assignments in writing.

Competence

Course prerequisites

Grading Philosophy

Test, Assignment/Quizzes/Presentation, Final Examination

Course schedule

Course type

Lectures (14 hours)

Online Course Requirement

Instructor

Prof. Ir. Dr. Abdul Manaf Hashim

Other information

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